| BANGALORE: Synopsys, Inc. has announced that Sony
Corporation has adopted Synopsys' alternating aperture phase-shift
mask (AA-PSM) technology to enhance manufacturability of its high-performance
chips. AA-PSM technology, which is part of Synopsys' comprehensive
design for manufacturing (DFM) product family, enables manufacturability
improvements through increased lithography resolution, enhanced yields,
decreased leakage current and better chip performance.
Synopsys' phase-shifting software and technology has been validated
with production silicon since the 130-nanometer (nm) node and is
the only commercially available strong phase-shifting technology
being used by several leading-edge semiconductor companies in IC
production. For designers, the benefit of this technology is tighter
control of critical dimension (CD), the width of feature sizes on
the silicon, and enhanced lithography resolution which is critical
at the 65-nm node and beyond. This tighter CD results in increased
chip performance and higher yield, which means more dies on the
wafer meet design specifications, states an official release.
"Our ability to support Sony's industry-leading production
ramp of their advanced process nodes demonstrates our PSM technology's
continued value in a production environment," said Anantha
Sethuraman, vice president of marketing for DFM, Synopsys. "This
validates Synopsys' leadership position in providing a comprehensive
DFM solution for high-yield designs."
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